Key Facts
• Dai Nippon Printing (DNP) announced a $300 million investment on July 10, 2025.
• Investment spans 2026–2028, a 50% increase from the 2023–2025 period.
• Focus on mass production of EUV photomasks starting in 2027.
• Strengthening production for high-end, mid-range, and low-end optical masks.
• Targeting a 55% revenue increase in the photomask business by 2028 compared to 2024.
• Plans to mass-produce templates for Nanoimprint Lithography (NIL) equipment by 2027.
• Pilot line for TGV glass core substrates to start at Kuki plant by late 2025.
• Mass production of TGV substrates expected by 2028.
• Collaboration with Shinko Electric Industries under review for synergy.
Summary
Dai Nippon Printing (DNP) has announced a $300 million investment in its semiconductor photomask business for the 2026–2028 period, marking a 50% increase from the current investment cycle. The funds will support the mass production of extreme ultraviolet (EUV) photomasks starting in 2027 and enhance production capabilities for optical masks across all market segments. DNP aims to boost photomask business revenue by 55% by 2028 compared to 2024. Additionally, the company plans to begin mass production of templates for Nanoimprint Lithography (NIL) equipment by 2027. A pilot line for TGV glass core substrates will launch at the Kuki plant in late 2025, with mass production targeted for 2028. Collaboration with Shinko Electric Industries is being explored to maximize synergy.
